ECE 5150

Course Description

Explores fabrication technologies for the manufacture of integrated circuits and microsystems. Emphasizes processes used for monolithic silicon-based systems and basic technologies for compound material devices. Topics include crystal properties and growth, Miller indices, Czochralski growth, impurity diffusion, concentration profiles, silicon oxidation, oxide growth kinetics, local oxidation, ion implantation, crystal annealing, photolithography and pattern transfer, wet and dry etching processes, anisotropic etches, plasma etching, reactive ion etching, plasma ashing, chemical vapor deposition and epitaxy; evaporation, sputtering, thin film evaluation, chemical-mechanical polishing, multilevel metal, device contacts, rapid thermal annealing, trench isolation, process integration, and wafer yield.